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产品名称

Hyper Blue

[Wafer Photolithography Solution]Photo Resist Stripper : Hyper-Blue ®
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产品描述

 Photo Resist Stripper : Hyper-Blue ®      

 
Product Function
  • Photo Resist  as a core material is used in the lithographic process for semiconductor circuit elements manufacturing process.
    In response to light, draws patterns on the wafer to form a fine circuit-pattern which is a photosensitive material for exposure process.
  • Stripper After completion of etching for semiconductor circuit, removes the photo resist, by-products generated in the process(Residue), non-volatile residue on surface and so on.

properties
  • Excellent Photo Resist removing speed
  • No residue after PR removal
  • Excellent wetting performance while washing
  • No effect deposited metal layers (Ni, Au, Ti, Al, ITO, Cr, etc.)
Range Of Products
  • Available up to Nano-Level that requires a high resolution
  • Usable to produce G-Byte DRAM, Flash Memory and Logic Device
  • Stripping G/I-Line resist by targeting each device
  • Removing various resists to materialize a minimum pattern width
Corresponding parameter set not found, please add it in property template of background
暂未实现,敬请期待
暂未实现,敬请期待
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